Used CANON PLA 501 #293644255 for sale

CANON PLA 501 is a high-end photolithography mask aligner used for the fabrication of semiconductor wafers. It is a cost-effective solution for customers who need to align and transfer multiple masks quickly and accurately. CANON PLA-501 has a maximum field size of 25mm x 25mm and up to 13 pattern openings. The design offers a minimum line width of 1 um with 0.5 um features possible on devices. It also has an alignment accuracy of 0.25 um, and a throughput of up to 20 wafers per hour. The system is also equipped with an advanced opto-mechanical design, enabling the exact positioning and control of the mask field size and pattern openings. PLA 501 has two powerful high-performance laser sources generating line and imaging beams. The airbearings system and the high-precision optical lenses guarantee a high quality of the mask opening profile. They also eliminate the guesswork and errors caused by manual alignment and manipulation. PLA-501 is also equipped with a mask pre-processing station for controlling the quality of the pattern, and for mask evacuation. It also provides automatic control and feedback, that makes it easy to ensure the quality of the pattern and the correct alignment during fabrication. Overall, CANON PLA 501 mask aligner is an efficient and reliable tool that meets the photolithography needs of semiconductor manufacturers. Its high precision and excellent performance, as well as its affordability, make it the perfect tool for any facility that needs to align and transfer multiple masks quickly and accurately.