Used CANON PLA 501 #293696568 for sale

CANON PLA 501 is a mask aligner used for photolithography processes. It is a desktop unit, with a built-in beam source, precision X/Y stage, and integrated stage controller. The device is capable of producing high-resolution imaging with a fine resolution of 1.0 μm. The beam source has a spot size of 0.1 mm, and operates with a power of up to 120 W. This is optimal for the formation of micro locations with precise control over process times and exposure dosages. The X/Y stage allows for precise and repeatable alignment of substrates and masks for processing, allowing for accurate image placement. The integrated stage controller allows for precision control of both axis movement. CANON PLA-501 also contains a dry air system WITH a quartz filter to ensure a clean environment and prevent contamination of the sample. It has an integrated vacuum chuck to secure the substrate, and can support substrates up to 100x100mm in size. In order to process a sample, the operator first loads the sample on the X/Y stage, then aligns the substrate or mask by manual or automatic movement. The exposure is then made with the beam spot moving across the sample. Post-process, the sample must be developed to reveal the pattern produced. PLA 501 is an important device for a variety of applications in semiconductor fabrication, and enables precise patterning of microelectronic devices. It offers excellent resolution, precise alignment of samples, and automated operation for reliable and accurate processing.