Used CANON PLA 501 #293758566 for sale

CANON PLA 501 is a mask aligner designed for the automated photolithography of wafers. The device employs a two-stage projection equipment that offers high quality patterning with a large field of view of 700 mm x 300 mm. This two-stage system provides a high-speed, low-energy alignment, reducing the time and cost of performing photolithography. The device also features a high contrast projection unit with excellent resolution capabilities. CANON PLA-501 has a cutting-edge optics machine, which provides 6x magnification and a laser NX90 alignment beam with a proximity sensor for highly accurate pattern alignment. The automated photolithography procedure is made possible by the tool's CCD camera, which keeps track of the wafer's position during exposure. It also incorporates an auto-focus asset that can adjust the position of the pattern on the wafer if the substrate moves or deforms. The device is also equipped with a high-accuracy, high-resolution imaging model that ensures favorable results for photolithography. This is achieved using a 6" wafer stage, a 9 mask stage, and an XYZ high-precision wafer stage with a traveling speed of 8 um/sec. Its ±45° free tilt capabilities enable users to perform large-scale lithography with different angles on the same substrate. PLA 501 also features reliable alignment and transfer accuracy with the combined features of its advanced patterning equipment and imaging system, which enables users to develop patterns accurately and efficiently. The unit also provides an environment that is friendly to the development process. Maintenance, which requires minimal effort, is ensured by an active maintenance counter that alarmingly keeps track of service data. PLA-501 is an all-in-one photolithography machine for wafer-level processing. Its useful applications and suitable design make it an ideal platform for a wide range of research and industrial applications such as microelectronics, MEMS, semiconductor or circuit processing and biotechnology.