Used CANON PLA 501 #9004050 for sale
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CANON PLA 501 is an advanced mask aligner designed to support processes essential to the fabrication of electronic devices. Specifically designed for photolithograph processes, CANON PLA-501 plays a critical role in the production of semiconductor integrated circuits and other components of microelectronic devices. PLA 501 is equipped with multiple features designed to optimize the mask alignment process. The mask aligner features a wafer stage plate, with automated vacuum suction, that facilitates precise alignment of wafers for lithography. This is coupled with a best-in-class digital imaging equipment which illuminates the mask to capture an image of the mask patterns. The imaging system uses a high-resolution CCD camera that can capture patterns with a resolution down to 0.5 μm. PLA-501 also features a fully automated focus adjustment unit that adjusts the focus of the optical source to match that of the wafer being processed. This machine allows users to monitor the focus quality during the lithography process, and achieve reproducible alignment accuracy and the highest resolution of production. The mask aligner also features pattern alignment and rotation for aberrations and other occurrences that could disrupt the image of the mask patterns. In addition to these features, CANON PLA 501 also offers a range of automated process options for increased efficiency and productivity. Users can choose from an automated chemical-coating process, which offers chemical uniformity and improved adhesion properties, as well as an automated anti-reflection coating, which reduces aerodynamic interference. Moreover, CANON PLA-501 offers many process options such as laser direct-writing and electron-beam direct-writing, which facilitate highly precise patterning and etching processes. Overall, PLA 501 is an advanced mask aligner designed to intelligently manage the alignment of mask patterns and reproduce their images in the photolithograph processes. The mask aligner offers various automated processes and superb resolution, enabling users to achieve the highest accuracy and precision possible with their production.
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