Used CANON PLA 501 #9030687 for sale

CANON PLA 501 is a mask aligner developed by CANON Inc. that is designed to accurately make patterns on a wafer using a laser. CANON PLA-501 utilizes high-energy focused laser beams to make precise, three-dimensional patterns with a minimum feature size of 14μm. It also features uniform and reliable alignment with optimal etch accuracy and minimal reflection. The masked alignment and exposure process is performed with the dual beam equipment. The beams used in PLA 501's patterning process are 25μm/100μm, 30μm/120μm, and 40μm/160μm. The dual beam system is used to simultaneously expose two patterns for two different processes, which makes PLA-501 capable of reducing the mask changes and doubling the throughput. CANON PLA 501 is equipped with a laser spacing device to prevent errors due to an insufficient amount of laser energy. It is also equipped with a laser scanning optical unit which is capable of adjustable scanning speed and can be easily adjusted without the need of mechanical adjustment. Furthermore, the device includes a precision altitude adjustment machine which maintains consistent performance and high accuracy. It also has a noise-dampening tool which insulates the paths of the laser to reduce resolution errors due to vibration and other environmental factors. The machine's overall specification is user-friendly and is flexible enough to adapt to different production requirements due to its software and dedicated operation functions. The machine's software is equipped with a low-noise optimizer function and is also capable of automatically adjusting the laser power and exposure time in order to optimize the pattern shape and reduce the occurrence of instability. Overall, CANON PLA-501 is a reliable and user-friendly mask aligner that can provide high-precision patterning accuracy and repeatability. Its Dual Beam Asset and its software functions make it an efficient and reliable machine for the production of wafer patterns.