Used CANON PLA 501 #9301351 for sale

CANON PLA 501 is a desktop mask aligner with a unique, low cost, and easy-to-use design. The product provides excellent and repeatable lithography performance due to its high spatial accuracy and accuracy control. The equipment has automatic alignment and wafer handling capabilities, allowing users to reduce time and costs associated with optical lithography. CANON PLA-501 features a high resolution, high energy, and low distortion detection system that enables accurate alignment and definition at the mask and the wafer level. The unit is powered by CANON proprietary, pulsed laser technology and can perform several exposures in a single operation. The machine uses a series of pulse widths and intensities to precisely expose the mask or the wafer. The unique laser arrangement ensures that the exposure is uniform across the mask or wafer. This promotes optimal results with fewer artifacts. The tool utilizes a two-stage exposure process for improving exposure distribution and focusing. The first stage is an alignment method which detects the mask pattern quickly and accurately. At the second stage, an optimal dose and exposure is applied to the substrate. This ensures that the pattern is consistently transferred to the substrate. The asset includes advanced software which can optimize exposure parameters to further improve precision and repeatability. The software also allows for high throughput and efficient performance due to the integration of multiple tools, such as alignment verification, automated exposure optimization, and measurement feedback controls. The software is easy to use and can be operated in any language. PLA 501 has a variety of features that make it ideal for both fundamental research and commercial applications. The model can handle a wide range of applications, including lithography on a wide variety of substrates. Its unique design and user-friendly functionality make it an excellent option for any laboratory.