Used CANON PLA-501E #9392307 for sale

CANON PLA-501E Mask Aligner is an industry-leading production tool for microfabrication and semiconductor processes. It is a fully automated photolithography equipment designed for high-precision wafer-level alignment and exposure of photomasks in the production environment. PLA-501E is one of the most accurate and reliable photolithography systems on the market, providing exceptional performance and superior results. CANON PLA-501E features a precision alignment system capable of producing highly accurate alignment of wafers to photomasks. It utilizes dual-axis positioning technology to ensure precise alignment capability of both wafer and photomask, providing fast and highly precise alignment of both parts. In addition, PLA-501E includes a high-resolution camera to detect alignment errors and provide real time feedback to adjust and improve upon alignment accuracy. CANON PLA-501E's advanced photomask positioning module offers highly precise alignment of the photomask components for a level of accuracy that is exceptionally high for a production tool. Its built-in control unit also provides real-time feedback to check all parameters for optimum performance. This ensures that the output is consistently high-quality and highly reproducible. With its high-precision exposure machine, PLA-501E provides excellent repeatability and reproducibility of photomask patterns in both uniformity and fidelity. It is also capable of high-bypass exposure of up to 10 sub-micron lines. CANON PLA-501E comes equipped with a top-notch automated wafer handling tool, which provides fast and reliable wafer-loading and unloading. The asset is highly efficient and provides secure handling of the wafer without any risks to its quality. In addition, PLA-501E offers a set of integrated process controls to ensure uniform performance throughout its production process. The model is also compliant with the latest industry standards, providing excellent flexibility and scalability. CANON PLA-501E is an industrial-grade photolithography platform designed to bring a great level of accuracy, accuracy retention, and scalability. It is an ideal choice for production environments that require precise, reliable, and high-level microfabrication processes.