Used CANON PLA 521FA #9170315 for sale

CANON PLA 521FA is a mask aligner designed for the precision fabrication of semiconductor devices. It is an automated, programmable, and configurable equipment which is capable of producing excellent quality wafers for both single- and double-sided processes. CANON PLA 521 FA features full-field ultraviolet (UV) illumination and an advanced photomask/substrate alignment system. It allows highly accurate substrate focusing and alignment using two cameras and two alignment marks on both sides of the substrate. Additionally, it is equipped with advanced substrates supports, designed to reduce thermal stress on the substrates and enhance the process yield. Furthermore, it enables sub-micron accuracy alignment with a maximum field of view (FOV) of 200x200 mm2. PLA 521FA offers two models, namely Standard and Super. The Standard model features a 13.5 kW UV mercury lamp, a digital-to-analog converter (DAC) shutter, and a maximum substrate area of 800x800mm2. On the other hand, the Super model is equipped with a 30 kW UV xenon lamp, an analog-to-digital converter (ADC) shutter, and a maximum substrate area of 3200x3200mm2. With an easy-to-use graphical user interface (GUI), PLA 521 FA also offers an improved performance with regard to faster alignment speed and enhanced production yield. It comes with advanced built-in software and hardware features that enable high-speed, real-time alignment, as well as high-precision monitor and control using an alignment and imaging system. In addition to its leading precision accuracy, CANON PLA 521FA is also exceptionally robust and durable. It is designed to resist corrosion, maintain optimal performance, and maximize equipment service life. It is also energy-efficient, as it can reduce electricity consumption up to 40%, compared to earlier models. Moreover, it is vibration-resistant and designed to be housed in a dust-proof, light-proof, and opera-proof environment in order to ensure optimal performance. Overall, CANON PLA 521 FA is an exceptional mask aligner, perfect for high-precision semiconductor fabrication. Its advanced features, robust build, and reliable performance make it the ideal choice for users who require precision and accuracy.