Used CANON PLA 600 FA #33364 for sale

CANON PLA 600 FA is a mask aligner specifically designed for use in photolithography. This device has a user-friendly interface and is suitable for applications such as semiconductor device fabrication, organic and inorganic thin-film deposition, and replication. The mask aligner measures 1060×830 mm and has an optimal productivity of 6,000 wafers per hour. It is equipped with two motorized mask stages which move independently of one another to maximize productivity. Additionally, the mask aligner uses an advanced control mechanism that allows for precise and repeatable lithography processes. CANON PLA-600FA is powered by two laser sources: a visible, argon ion laser, and an ultraviolet (UV) xenon flash lamp. The argon ion laser offers a wide wavelength range of 504-514 nanometers and provides optical resolution of < 2 microns. The UV xenon flash lamp is used to create and examine the resist pattern at a wavelength of 248 nanometers. The device also features the ultra-high precision Pre-Alignment Unit, which accurately positions the mask to the wafer by measuring pattern matching points and recognizing distortion. This mask aligner is equipped with a DSP (Digital Signal Processing) system, which enables users to control the image size, position and deformation. It also allows users to create high-precision patterns with a high-speed, high-precision alignment accuracy. Automated alignment and imaging is performed with a 4-axis motor, which allows for fast and accurate positioning. The device is also capable of detecting extremely small particles, down to 2 microns in size. PLA 600FA also features an advanced numerical optimization algorithm that improves process yield and reduces lithography time. It also has a task-defined feature, which allows users to assign tasks to specific units and to automatically optimize the system for each task. In addition, CANON PLA 600FA has a built-in diagnostics and self-diagnostics system which allows users to diagnose and troubleshoot easily. Finally, PLA 600 FA is an excellent choice for photolithography processes that require high accuracy and fast processing. This device is ideal for industrial applications and is reliable, efficient, and cost-effective.