Used CANON PLA 600 FA #9015364 for sale

CANON PLA 600 FA is an advanced photo-lithography mask aligner produced by CANON ASIA. Its advanced technology is designed to provide a highly accurate and reliable mask alignment for products that require high precision in the lithography process. CANON PLA-600FA is constructed to support alignments between wafer masks and wafer or substrate surfaces. It consists of major components such as an air bearing stage, a photoreceptor stage, a light detection stage, and a wafer transport unit, all of which are designed to provide precision alignment. The air bearing stage provides an optimal working environment for the mask stage and wafer stages. This is achieved through the miniature air bearing cartridges which contribute to a low roughness elastomer layer for extremely smooth and accurate motion. In addition, an in-plane stage motion system, consisting of two linear guide rails, is used to ensure high-accuracy stage travel and positioning. The photoreceptor stage is designed to allow for accurate mapping between wafers and mask patterns. This is enabled by the stepper motor zooming mechanism, which is capable of providing a field of view up to 700 microns with high accuracy. In addition, an integrated imaging system captures images taken from four shooting angles and a dual UV-IR light source illuminates the wafer and mask stage for inspection purposes. The light detection stage is designed to provide long-term stability. This is achieved through a non-contact optical power detector, which accurately detects light intensity emitted by the wafer and masks for ensuring an accurate alignment. Lastly, the wafer transport unit allows for fast and efficient movement of the wafer and masks. This is enabled by the use of variable pitch coils, which contribute to larger smoothness than conventional lead screw systems. Overall, PLA 600FA is an advanced, highly precise, and reliable mask aligner. Its advanced technology is designed to provide highly accurate and reliable alignment between wafer masks and wafer or substrate surfaces.