Used CANON PLA 600 FA #9030686 for sale

CANON PLA 600 FA
Manufacturer
CANON
Model
PLA 600 FA
ID: 9030686
Mask aligner.
CANON PLA 600 FA Mask Aligner is a high-end optical step-and-repeat alignment equipment. It is designed for wafer-level lithography processes, and is capable of accurately aligning and patterning with +/- 5 microns of accuracy. The system is ideal for applications in the semiconductor industry, such as chip patterning, packaging, MEMS, and optical components. The alignment unit features a full-field 8-channel ADC image acquisition machine. This sensor has extremely high resolution and high sensitivity, allowing it to capture detail even in low contrast or high modulation images. The tool has a wide field of view, allowing for wide-angle exposure and imaging. It also has a high throughput capability, allowing for high-volume automated production. CANON PLA-600FA Mask Aligner has a split-field optical A-axis, which allows it to make precise two-dimensional patterning of the patterned areas. This A-axis is used to control the masking, alignment, and etching processes. It is also used to accurately define the etch pattern and ensure accuracy with every process. The asset is equipped with a CCD camera and spectral filter that allow it to accurately detect the alignment features of the mask. The alignment is achieved by calculating the difference between the mask pattern and the wafer pattern. The model also features an automated laser detection equipment that detects the true-center of the mask, providing accurate and repeatable patterning without manual adjustments. The system can generate a variety of alignment patterns such as square, circular, and hexagonal patterns. It also has a high-precision micro-stepper motor, ensuring accurate and repeatable movements of the alignment features. In addition, PLA 600FA Mask Aligner has a stepper motor controller, which allows for precise vertical and horizontal alignment of the patterning. With CANON PLA 600FA Mask Aligner, you get a high-end optical unit for wafer-level lithography processes. It offers high accuracy and repeatability, which make it ideal for high-volume production. It also provides the flexibility to create a variety of alignment patterns and features a CCD camera and laser detection machine for precision alignment.
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