Used CANON PLA 600 FA #9148245 for sale

CANON PLA 600 FA is a high-precision mask aligner that is designed for use in advanced lithography technology. It features a very high accuracy that ensures precise patterning over a wide area. This allows users to achieve desired designs without increasing the resolution of the photomask. The mask aligner operates in a range from 355 to 420 nm and has a large field size of 600 mm. It also features a high resolution magnification from 1x to 16x. The mask aligner can perform an alignment on the order of one micron, which is necessary for the production of sub-micron features. The scanner has a built-in air bearing stage with a resolution of 0.8 microns and a repeatability of 0.1 microns. This stage is designed to ensure precise alignment of the mask with the wafer. It is also equipped with a high-resolution CCD camera, which has a pixel size of 5 μm and a lateral resolution of 4 μm. The CCD camera uses homodyne, auto-correlation, and gradient techniques to ensure alignment accuracy. The mask aligner is also equipped with an Actinictm wafer stage. This stage has a magnification of 5x with a 10-micron stage resolution and a repeatability of 1 micron. In addition, the scanner features a beam scanning system that allows for a fast and stable scan profile. CANON PLA-600FA mask aligner is also equipped with software that improves its abilities. The LexEco toolkit is used for managing various parameters such as optimal exposure time and dose. This ensures the aligner has the necessary parameters for proper data collection and analysis. It also features defect detection, wafer mapping, and distance measuring functions. PLA 600FA mask aligner is a highly precise instrument for lithography technology. Its accuracy and resolution make it a great choice for sub-micron feature production. Its built-in air bearings and wafer stage ensure consistent alignment of the mask with the wafer, and additional software and functions make the aligner suitable for many specific tasks.