Used CANON PLA 600 FA #9226487 for sale

CANON PLA 600 FA is a mask aligner, which is an instrument used for semiconductor lithography processes. It is used to transfer patterns from a photomask template onto the surface of a substrate. The instrument utilizes ultraviolet light from a laser source in order to accurately align the photomask with the substrate prior to transferring the pattern on the substrate. This instrument has a relatively large working area with a base width of 600mm and a maximum substrate diameter of 450mm. It has a highly accurate height adjustment with a resolution of 0.1 microns and a Z repeatability of 0.5 microns. It also comes with a wafer indexing system and an auto focus function, which allows for precise alignment between the photomask and the substrate. In terms of real-time, high-speed control, CANON PLA-600FA has an automatic pattern search system that allows it to scan large-sized sample from top to bottom in order to identify the necessary patterns. This system enables the user to reduce pattern searching time for large on-chip devices or large area grids. Other features include an automatic exposure timer and an improved light projection module, allowing for more consistent and reliable results. In terms of safety performance, PLA 600FA meets all current industry standards in terms of dust-proofing and anti-static measures. It is also designed for easy maintenance and easy operation, equipped with both manual and automatic operation modes. Overall, PLA-600FA is well-suited for lithography processes in the semiconductor industry, providing accurate and reliable results in a safe and efficient manner. With its large working area, high-accuracy height adjustment, high-speed real-time control, and a number of safety features, it is a versatile and reliable instrument that can be used for a variety of lithography processes.