Used CANON PLA 600 #293594861 for sale
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CANON PLA 600 is a mask aligner designed for use in photolithography applications. It is a semi-automatic platform for wafer processing with a comprehensive suite of features and integrated tools. The features include a high precision stage for precise pattern positioning and alignment, an integrated microscope for wafer analysis, and state-of-the-art illumination and programmable filter systems. The semi-automatic operations of the aligner make it suitable for both manual and automated processing. The detailed integration of the machine ensures a complete cycle of processes that begins with the loading of sample and ends with the unloading of processed wafer. In the middle of the cycle there are various processes such as pre-alignment, exposure, data analysis, post-alignment, and unloading. The machine can perform its various tasks at a speed of up to 100 wafers per hour. At the heart of the mask aligner is an optimized optical equipment which is supported by an advanced real-time image processing system. It is a highly versatile unit that can handle a variety of photomasks, such as standard lithography masks, interferometric type, binary, contact and laser masks. The machine also can be used in binary lithography applications, where it can cope with the complexities associated with the detection of small features. PLA 600 offers the user a number of advantages, including ease of operation and maintenance, high precision, peak performance, and affordable investment costs. One of the key features is its innovative mask pattern recognition machine, which uses a library of advanced algorithms for mask pattern recognition. This critical feature simplifies the process of alignment with excellent pattern matching capabilities. The advanced feature set also includes a highly sensitive light source and digital projection tool. These components provide excellent sensitivity and resolution, making it possible to make high-quality micro-structures. Additionally, the machine is provided with an interface to control certain parameters such as exposure dose and number of exposures. It is also equipped with a laser source for advanced pattern generation. Finally, CANON PLA 600 offers a range of safety features that ensure that the environment is safe to use and that the machine is operating correctly. These include an automatic interlock asset, air-purification model, and automatic diagnostics. The machine can be integrated with other peripheral equipment to form a complete lithography processing equipment.
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