Used CANON PLA 600 #293655815 for sale

CANON PLA 600 is a mask aligner that is used for the production of wafers in the semiconductor industry. This machine is designed for positioning, alignment, and exposure of photomask and wafer under optics. It is suitable for use with both binary masks and attenuated attenuated phase shifted masks (PSM). The device consists of an adaptive stepper, a pressure-controlled exposure platform, and a servo-controlled Z-axis stage. PLA 600 features a movable stepper that can be configured for different microfabrications processes including optical exposure, deposition, lithography, etching, and other processes. Additionally, the device can store up to 1024 scanned images. The pressure-controlled exposure platform of CANON PLA 600 allows uniform pressure control throughout the exposure process to ensure accurate positioning of the masker and wafer. The pressure adjustment function ensures a uniform exposure edge. The Z-axis stage of PLA 600 is designed to move the masker and wafer to the optimal position for exposure. The stage is also designed to accurately align the masker with the wafer, providing superior registration of the image being exposed. The stage is also designed to accurately move the masker and wafer to ensure exposure on the target surface of the wafer. CANON PLA 600 is operated using a graphical user interface which includes system monitors, setting adjustment, image display and a variety of other functions. The machine also has a number of safety features such as a self-alignment system, emergency stop button, and protective covers to prevent physical injury. PLA 600 is capable of precisely positioning and aligning the masker and wafer for accuracy and efficiency in the microfabrication process. The device is reliable, easy to use and provides precise and uniform exposure across the wafer. The savings in time and increased productivity provide an attractive return on investment.