Used CANON PLA 600F #9397141 for sale

CANON PLA 600F is a state of the art mask aligner designed for high-precision photolithography. This tool helps to accurately deposit layers of materials onto a substrate in a uniform and repeatable manner. It is suitable for a wide range of photolithography applications including semiconductor, LED, MEMS, and bio-medicine industries. CANON PLA600F equipment uses mechanical centering to accurately align the substrate with the mask and light source. It has a height adjustment of +/- 1mm and an XY positioning accuracy of ±0.6μm. It utilizes highly precise mechanical moving stages with an XY error range of a few µm. The system also features high-performance optical lenses, allowing for precise alignment at resolutions of up to 1µm. The unit is easy to operate with a variety of user-friendly software control screens. The menus are designed to provide a straightforward user experience. There are three exposure modes available; normal, Soft Touch and Fast Exposure. In addition, the machine can store up to nine sample parameters for easy data recall. The aligned mask is then exposed with the machine's mercury lamp using the appropriate exposure time and wavelength. The lamp is stabilized ensuring a consistent light intensity at all times. The tool also has a built-in OPC (optical proximity correction) processor. This asset is capable of providing optimal exposure settings based on the user's process requirements. PLA-600F mask aligner is an efficient and reliable tool that enables users to obtain highly accurate and repeatable photolithography results time and time again. It provides an easy to use interface, accurate mechanical centering, powerful optical lenses, high-performance mercury lamps and built-in OPC correction. This combine to make CANON PLA 600 F an ideal choice for a variety of photolithography requirements.