Used CANON PLA #9244761 for sale

CANON PLA (Parallel Layer Aligner) is a mask aligner designed for wafer stepper/scanner based lithography. It is a stepper-compatible programmable laser alignment equipment that enables automated overlay alignment capabilities by combining optical and software capabilities to measure and align between layers in different layers. PLA utilizes laser alignment techniques and high-resolution optical microscopy to accurately measure the relative alignment of two layers. The laser alignment is achieved by using a laser and a silicon wafer on which an image of each layer is reflected. When the alignment of the two layers is determined to be accurate, it is written into the lithography recipe as a result. The system recognizes patterns from a single image taken from an overlay test wafer, and then compares it to a reference data set. It can measure the relative alignment of two layers down to sub-micron accuracy. CANON PLA is equipped with a powerful imaging algorithm that simplifies and accelerates the positioning of multiple layers while eliminating the need for multiple images. The unit also has a number of built-in tools, including an alignment verification tool, a pattern matching tool, and an edge detection tool. PLA is designed to reduce set-up time and to minimize the number of exposures required for production. Its power is coupled with the flexibility of a programmable laser machine, allowing a user to control all the parameters of the alignment process. It is also highly automated, allowing for accurate and repeatable alignment of multiple layers. Overall, CANON PLA is an extremely reliable and useful lithography tool that offers excellent accuracy and the potential to achieve fast throughput production. With its combination of optical and software capabilities, it is an invaluable addition to any production environment.