Used CANON Wafer conversion kits for PLA 501 #9160415 for sale

CANON Wafer conversion kits for PLA 501 are tools used to enhance the flexibility of the mask aligner. The mask aligner is a machine used to create nanostructures on the surface of chips with feature sizes of 10 nm or less. The mask aligner consists of various components and mechanisms that enable the precise alignment of the various masks used during the lithography process to etch the desired pattern on the substrate, which is typically a wafer. The use of the wafer conversion kits is necessary when the mask aligner is used to process wafers with different sizes, pitches, or thicknesses. Each conversion kit is designed for a specific type of wafer. Wafer conversion kits for PLA 501 include a variety of interchangeable parts for wafer processing. The kit includes a chuck holder that is mounted on to the main body of the mask aligner. The chuck holder holds different types of chucks that the substrate is laid on during the exposure process. The chucks come in various shapes and sizes to accommodate different types of wafers. Additionally, the kit includes a 4-position chuck loader that is used to secure the wafers when they are inserted into the mask aligner. The wafer conversion kit also comes with a motorized wafer displacement device, which is used to precisely and accurately position the substrate during alignment. The kit also includes a diaphragm seal, which prevents moisture from seeping into the mask aligning machine, thus ensuring that the wafers are exposed correctly and accurately. Finally, the kit includes a wafer mask stacker, which is used to help align the masks into the correct position. The masks are precisely aligned using this stacker, allowing the desired patterns to be etched accurately onto the wafers. Overall, CANON Wafer conversion kits for PLA 501 provide an efficient and accurate method for mask aligner users to process wafers with different sizes, pitches, and thicknesses. The various components of the kit enable the mask aligner to precisely align the mask and accurately expose the wafer with the desired pattern.