Used COBILT CA 400 #10357 for sale

Manufacturer
COBILT
Model
CA 400
ID: 10357
Wafer Size: 2"-3"
Aligners, 2"-3" Includes: Split field optics Resolution: 2 to 3 micron.
COBILT CA 400 Mask Aligner is an advanced photo-lithography exposure equipment designed for Manufacturing Wafer Mask Substrates. CA 400 is a fast, accurate and efficient way to produce fine-feature masks for precision integrated circuit (IC) devices. The aligner's mask-making abilities offer greater control over production times for various types of device fabrication. COBILT CA 400 utilizes a combination of high-resolution printing heads and pattern editors to create precise fine-pattern substrates for mask-making. The aligner can accept multiple sizes of standard wafer substrates and the positional accuracy of the printed patterns is ensured by a coordinate measuring system (CMS) equipped with a very precise quattro controller. CA 400 offers excellent exposure accuracy, with exposure levels ensuring compliance with IC industry design standards and photo-lithographic criteria. The exposure accuracy is further improved by the mask-completion module with which owners can complete multiple masks in as little as one exposure. The module utilizes its own specialized software to operate and thus helps COBILT CA 400 with tasks such as mask pattern recognition and substrate preparation. CA 400 is also equipped with other features, such as an output monitor which allows users to check on the status of the operations before the wafer wins. The feedback helps to ensure that the wafers have been correctly exposed and clean. A highly advanced diaphragm system is employed by COBILT CA 400 to achieve uniform light distribution across the entire mask surface area. As a result, fine pattern matching can be accomplished with rapid exposure times. The highly sensitive thermal plates used in the aligner also help to provide consistent and accurate mask alignment, ensuring that masks are appropriately placed for processing. CA 400's powerful features, such as automated mask placement and superimposed pattern registration, help the device to achieve a level of efficiency not usually seen in such products. COBILT CA 400 can quickly complete the mask-making process, reducing the amount of manual labor involved in the process while producing masks that match the design requirements of IC-device designers. In addition to CA 400's advanced features, the device also boasts of minimal cost and minimal maintenance. Because of the cost efficiency and low maintenance requirements, small companies and start-ups are more likely to be interested in using the aligner. This, along with its advanced functionality such as mask-completion and thermal-plate capability, make COBILT CA 400 an attractive option for modern mask-making needs.
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