Used COBILT CA 800 #69878 for sale
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ID: 69878
Wafer Size: 4"
Mask aligner, 4"
Includes:
Split field optics
(2 to 3) Microns resolution
350 Watt lamp and power supply.
COBILT CA 800 Mask Aligner is a device used for photolithography processes in the fabrication of semiconductor devices. This device uses a high-power UV lamp to project a precise pattern, which is etched onto a substrate material. CA 800 device's main components include an alignment microscope, a stage, photo-sensitive masks, a castellated mask holder, and an excimer laser. The alignment microscope is used to align the camera with the mask and substrate, and also to identify any distortions that may occur due to mask rotation or misalignment. To ensure accuracy, a sensor system is used to compensate for any errors during the alignment process. The UV lamp used in COBILT CA 800 is capable of producing powerful UV light, which is directed at the mask to accurately project the precise patterns. The castellated mask holder helps keep the mask stable during the photolithography process, while the excimer laser is used to clean and improve the stability of the photolithography process. Once the mask is mounted onto the mask holder, the stage moves the substrate over the mask and the UV light is used to etch the pattern onto the material. The speed of the UV light can be adjusted to increase or decrease the number of features etched per unit of time. This feature allows for high production rates and precision when manufacturing small feature sizes. CA 800 system provides precise alignment with a high resolution and a range of adjustable parameters. The system is well suited for the most demanding wafer fabrication applications and its automated features make it easy to use and cost effective. It is also capable of processing multiple substrates in rapid succession making it suitable for mass production.
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