Used DNK MA-4200 #9144227 for sale

DNK MA-4200
Manufacturer
DNK
Model
MA-4200
ID: 9144227
Vintage: 2009
Mask aligners 2009 vintage.
DNK MA-4200 mask aligner is a lithography equipment equipment designed to create high quality, intricate patterns on various substrates. This system is used in semiconductor, data storage, biomedical, automotive, consumer and aerospace industries. DNK MA4200 is equipped with a high-precision 4-axis positioning stage and a high-quality microscope objective lens that offers deep focus, high resolution and excellent contrast. MA 4200 uses a reticles which is a transparent sheet with complex objects and patterns that are used to form a mask. The reticles are placed in the exposure area of the unit and exposed to a light source. This process outlines the pattern onto a substrate, creating a relief pattern on the surface. Once exposed, the substrate can be processed and constructed as desired. The entire process is automated and highly accurate, allowing for fast, precise and reliable results. MA4200 features an integrated integrated vision machine, ensuring each exposure is spot on. This tool can accurately and flexibly align each exposure, which is critical when aligning multiple masks with complex patterns and layouts. Additionally, the software is easy to use and the asset is compact, which allows for a smaller footprint in comparison to a full-size stepper. This mask aligner uses dual illumination, which helps reduce overlay errors and ensures consistent and accurate results. The lighting within the model is constantly monitored, allowing for maximum exposure and consistent performance. Furthermore, the equipment is equipped with a capture station, which provides a clear and accurate record of each exposure and result. DNK MA 4200 mask aligner offers exceptional quality, precision, and flexibility at an affordable price. Its ultra modern design, combined with advanced features, makes it a great choice for small to mid-sized production runs. Its performance and capabilities are ideal for today's highly complex fabrication and manufacturing requirements.
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