Used DNK MA-4200 #9144228 for sale

DNK MA-4200 is a mask aligner, a tool designed to precisely align masks over a substrate for photolithography. DNK MA4200 meets the industrial standards in advanced photolithography for its excellent performance, accuracy, and high precision. It comes with a number of features and capabilities that allow it to attain the perfect alignment of most masks over a range of substrates. The design of MA 4200 ensures that it is capable of performing both single- and double-sided mask alignments and this is done using advanced algorithms that allow for precise alignment of both sides of the mask with the substrate layer. The equipment also utilizes a unique digital image capture technology to ensure perfect alignment of images on the substrate layer. The alignment process is also assisted by a self-recalibration feature that enables the system to get the alignment angle and distance right the first time. MA4200 is powered by a robust, stable platform that allows for sophisticated processing capabilities and achieves a non-uniformity in the alignment process. This ensures that even the most complex and intricate masks can be accurately aligned on the substrate layer. In addition, the unit has powerful imaging features that offer users greater levels of accuracy, speed, and success throughout the alignment process. The machine also features a number of environmental and user friendly controls that ensure alignment processes are eco-friendly and safe for users. This includes features such as a built-in auto-clean feature, exhaust-management tool, protective covers, and sanitary curtains. The built-in safety locks and light sources, meanwhile, help to keep operators safe during the alignment process. DNK MA 4200 can also be integrated with a range of computer systems and software applications such as Autodesk AutoCAD, a tool that helps in the control of the entire alignment process and images. Lastly, the asset also has the capability to carry out inspections, which provides continuous monitoring and ensuring accuracy throughout the photolithography process. Overall, MA-4200 mask aligner offers a reliable and cost-effective solution for deep photolithography processes for both industrial and research purposes. With its advanced features and user-friendly design, it provides the perfect combination of accuracy, flexibility, and performance.