Used ELS TECHNOLOGY ELS 106FA #9052741 for sale

ELS TECHNOLOGY ELS 106FA
ID: 9052741
Fully automatic mask aligner, 2" - 8" Mask Size: 4" - 9" Lamp House: 250W, 500W, 1KW Wave Length: Broad Band, 365/400/436nm Light Intensity: >20mW / cm2 Based on 365nm (250W); >40mW / cm2 Based on 365nm (500W) Light Intensity Uniformity: < 3% Effective Exposure Area: Max. 150 mm x 150 mm / Max. 200 mm x 200 mm Transportation: Double Arm Robot Exposure Mode: Proximity, Soft, Hard, Vac. Contact Alignment Key: 150 x 150um and smaller Alignment Accuracy: ± 1um L/S Resolution: 1um Based on contact Mode, PR thickness: 1um Running Time: < 28 sec./pc System Control: PC Base Option: Cut Filter, Double Sides Alignment.
ELS TECHNOLOGY ELS 106FA is a modern, high-end Automated Mask Aligner for microelectronics and photonics fabrication. It is an ideal solution for any research and development-oriented company, laboratory, or university. ELS TECHNOLOGY ELS-106FA utilizes the latest advances in lithography technology to provide highly accurate lithography for a wide range of applications. The main components of ELS 106FA are a controller, a stage deck, a stage wheel, a mask carrier, a pattern generator, a wafer handler, and a wafer table. The controller is a desktop computer, equipped with the latest Windows 10 Pro software package, purpose-built for running ELS-106FA lithography equipment. The stage deck and stage wheel provide precise movement of the wafer and mask table relative to each other. The mask carrier holds the pattern generator, which is responsible for generating the desired lithographic pattern. The wafer handler transfers the wafers from the wafer table and into the stage deck. Finally, the wafer table is the platform on which the mask and wafer are aligned and fixed. ELS TECHNOLOGY ELS 106FA utilizes a patented, stage-skipping mask alignment procedure. This patented technology is designed to reduce the time needed to align the mask and wafer accurately. ELS TECHNOLOGY ELS-106FA is an automated system, capable of performing the desired lithography pattern with no operator intervention. This unit also has a top-of-the-line 8-µm resolution, making it suitable for most applications demanding high accuracy. In addition to its powerful lithography capabilities, ELS 106FA also supports numerous pattern-generation technologies. This includes using a library of custom-developed design templates or applying customized settings to user-provided masks. Furthermore, the machine is capable of controlling the exposure of individual boards independently, enabling more complex and advanced lithography designs. ELS-106FA has numerous other features and capabilities. For instance, the tool supports compliance with industry standards, including IPC-A-600 and IPC-7351. It also supports reporting and traceability for up to 500 fused wafers at a time. Additionally, the asset supports a variety of automated quality assurance tools. In conclusion, ELS TECHNOLOGY ELS 106FA Automated Mask Aligner is unparalleled in its performance and capabilities. It provides automated lithography with high resolution, supports multiple pattern-generation technologies, and supports industry standards. All of these features make ELS TECHNOLOGY ELS-106FA the perfect choice for microelectronics and photonics fabrication.
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