Used ELS TECHNOLOGY ELS 106FA #9156035 for sale

ELS TECHNOLOGY ELS 106FA Mask Aligner is an advanced, high-speed tool for the accurate and precise alignment of photomasks and substrates in semiconductor and optoelectronic research. It is designed for applications requiring direct alignment of the mask to the substrate, or for contact or proximity mask exposure. ELS TECHNOLOGY ELS-106FA Mask Aligner features a touchpanel controller, Stepper Motor controls, and fully automated and computer-controlled mask and substrate alignment. This compact, powerful, and user-friendly system enables simplifed operation and unsurpassed accuracy. Its innovative features include an automatic mask cleaning system and a patented wet processing module. ELS 106FA Mask Aligner operates under a variety of alignment modes. Alignment accuracy is enhanced by full-field sensors with 0.7 μm resolution, giving the user greater control of exposure precision. It is also equipped with a 1,000 micron per second laser correction capability. The alignment operator can determine the angular degree of alignment (tilt) by rotating a "fine-tilt" knob; this allows for a +/- 1 degree accuracy. ELS-106FA Mask Aligner's advanced features enable optoelectronic research and development professionals to create cost effective, high quality, and reliable integrated circuits. It is designed to operate in a range of temperatures, from -10°C to 50°C, and supports various lens resolutions including 0.4 µm to 200 µm. ELS TECHNOLOGY ELS 106FA Mask Aligner offers excellent value for money. Its reliable, high performance, and cost-effective design makes it an ideal solution for any optoelectronic research lab or production facility. Its advanced features, such as wet processing and laser correction, enable precise control of photolithography results. The ease of use and the user-friendly interface ensure that the ELS 10FA Mask Aligner is a productive and reliable tool for photolithography applications.