Used ELS TECHNOLOGY ELS 106FA #9359456 for sale

ELS TECHNOLOGY ELS 106FA is a 4-inch mask aligner ideally suited for automatic lithography of mid-to-high density electronics such as printed circuit boards (PCBs) and semiconductor components. It is a state-of-the-art product providing superior mask alignment accuracy, high throughput, and low cost of ownership. This mask aligner utilizes an advanced lens equipment providing a resolution down to 0.55 microns with uniform illumination and precise mask placement in the exposure field. Its wide exposure range and exceptionally low distortion make it suitable for flip chip assemblies. The integrated controller of ELS TECHNOLOGY ELS-106FA contains an embedded PC with intuitive graphical user interface. Control and monitor the entire process locally or remotely through LAN and WAN connections. The controller features sample-and-place integrated calibration and features multi language support, making it suitable for global operation. ELS 106FA comes with several additional features for optimum performance and efficiency. The advanced zoning illumination technology reduces the distortion, improves the accuracy and enables fast throughput even for high density designs. High accuracy and extremely fast reticle alignment achieve full-band accuracy as well as high volume mass production. Its wide-angle telecentric optics provides better than 2µm alignment accuracy over the entire work envelope. ELS-106FA is ideal for high-volume production and comes with an advanced job management system. Its automated sample registration and registration alignment makes sure that the same mask registers correctly on every wafer. The advanced job editor helps to set up and manage the complex mask alignment, exposure, and deposition jobs quickly and efficiently. ELS TECHNOLOGY ELS 106FA is also designed with a sophisticated vacuum chuck, providing superior retention force while minimizing damage to the underlying surface. It is capable of processing a variety of substrates and materials as well as contact sockets such as flip chip assemblies. With its optimized exposure time, ELS TECHNOLOGY ELS-106FA allows for significantly improved yield. ELS 106FA mask aligner is the ideal tool for automatic lithography of mid-to-high density electronics such as PCBs and semiconductor components. It features a highly accurate lens unit, an intuitive controller with integrated calibration, advanced zoning technology, and job management machine for full-band accuracy and high-volume production. Its flexibility and cost-efficiency make it an excellent choice for a variety of applications.