Used ELS TECHNOLOGY ELS 106SA #9059476 for sale

ELS TECHNOLOGY ELS-106SA is a compact and easy-to-use mask aligner for the fabrication of high-quality semiconductor devices such as memory chips, logic devices, and thin-film transistors. ELS-106SA is designed to align and transfer high-resolution photomasks over the wafer surface accurately and quickly with a scan area of up to 5mm x 4mm. ELS TECHNOLOGY ELS-106SA's advanced optical alignment equipment automatically detects the feature size, alignment error, overlay accuracy, and process parameters for all photomask and wafer layers. ELS-106SA is equipped with a highly sophisticated, motorized alignment system that automatically detects all terminal points with 20nm accuracy in the photomask and wafer layers. In addition, the position setting for the mapping of photomask patterns to the wafer is also automatically controlled. The alignment unit is enhanced by a built-in laser scattering machine that provides accurate dynamic overlay measurements, allowing for precision alignment of photomask patterns to the film layers below. ELS TECHNOLOGY ELS-106SA is also equipped with a high-efficiency stepper motor for precise positioning of the photomask on the wafer. This motor is coupled with an indexer and powered by ELS-106SA's embedded microcontroller tool, providing precise nano-level alignment. ELS TECHNOLOGY ELS-106SA also features auto-focus capability, allowing the user to optimize their exposures with higher resolution and accuracy, while still providing robust performance. ELS-106SA is also outfitted with an ambient temperature-controlled environment, regulated by its temperature controller, to ensure a stable process. This additional feature helps to ensure low photomask to wafer proximity which is critical for applications such as strained silicon technology. ELS TECHNOLOGY ELS-106SA is stand-alone, but can be individually configured to fit a variety of testing and process requirements. It supports platform neutral testing conditions, and can be be integrated with other systems for automatic defect detection and for photomask optimization functions. ELS-106SA also features remote access for remote monitoring and analysis of asset performance, as well as for troubleshooting. In conclusion, ELS TECHNOLOGY ELS-106SA is a robust and reliable mask aligner, capable of delivering high quality photomasks for a variety of semiconductor devices. Its advanced auto-alignment and auto-focus capabilities ensure unmatched accuracy and repeatability, while its temperature controlled quartz elements provide the stability required for high resolution wafer processing. Its other features such as remote access, platform neutrality, and integration with other systems further add to its effectiveness.