Used EVG / EV GROUP 40 #9197307 for sale

EVG / EV GROUP 40
Manufacturer
EVG / EV GROUP
Model
40
ID: 9197307
Wafer Size: 8"
Alignment measurement system, 8".
EVG®/EVG / EV GROUP 40 Mask Aligner is a versatile and precise photolithography equipment designed for fabricating consistent microstructures on semiconductor devices. The system allows the alignment and reliable exposure of substrates up to 3.7 inches in size using uniform UV light in a controlled environment. The Mask Aligner's unique dual-stage design ensures the accurate and clean exposure of every layer, while a standard built-in vacuum keeps the substrates tightly secured during lithography processes. Furthermore, the unit is capable of handling a wide variety of photomasks and other optically clear substrates for superior results. The Mask Aligner is equipped with an advanced digital alignment machine that allows for precise positioning of the optically clear substrates during exposure. The alignment tool utilizes two stages of fine adjustment for perfect registration accuracy, ensuring each microstructure is successfully exposed with a clean and uniform finish. Additionally, a unique optical alignment sensor tracks the exact placement of the substrate, eliminating misalignments and guaranteeing accuracy of repeated exposures. The asset's optical chamber is designed to reduce light scatter for uniform UV light exposure across the entire substrate. This ensures that identical structures can be accurately replicated on each and every layer, while the built-in vacuum allows for tightly secured substrates that remain stable and secure throughout the process. In addition to its automated alignment capabilities, the Mask Aligner can also handle a variety of optically clear and translucent substrates to facilitate clean and consistent lithography. For more specific needs, the model can be customized with specialized software, hardware, and accessories (e.g. high precision heating stages, high performance UV lamps). Moreover, the Mask Aligner can be integrated with existing production lines for seamless integration and ultimate versatility. Overall, EV GROUP®/EVG 40 Mask Aligner is an ideal choice for any operation that requires extreme precision and accuracy. Its advanced optical chamber, automated alignment equipment, and ability to handle various substrates make it an ideal choice for semiconductor device fabrication and other high tech manufacturing operations.
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