Used EVG / EV GROUP 40 #9232667 for sale

The |EVG / EV GROUP 40 mask aligner is a highly accurate and efficient microlithography tool, capable of aligning and exposing patterns onto various substrates. The precision of the mask aligner is derived from its advanced vertical resolution of 0.6 μm, along with a repeatability rate of up to 10 µm for optimal placement of projected images. This precision ensures that patterns are accurately exposed onto the substrate in a longer-term manner, preparing the substrate for subsequent lithography process steps. The advanced stage design of the |EVG 40 mask aligner ensures extreme accuracy and repeatability prior to any alignment process. The stage is able to move travel up to 600 mm with a repeatability of 0.05 μm and a positioning accuracy of 0.3 μm. This ensures that substrates are properly prepared for face-down alignment and can be repeatedly and accurately exposed. This stage design also allows for high-precision pattern shifting while exposing the same pattern onto multiple substrates. In order to facilitate efficient production processing, the |EV GROUP 40 mask aligner is equipped with a highly efficient mask loader. The easy-to-use loader is designed to store up to 40 masks and to index these masks in an orderly fashion, thereby ensuring production consistency throughout. This swift and precise mask loading process further improves production time and minimizes the risk of error. The |EVG / EV GROUP 40 mask aligner can also facilitate high-volume production runs with its highly efficient projection display system. With an exposure resolution of 0.6 μm and a high-resolution projection display of up to 1056 x 2032 dots, the system is designed to generate a wide variety of lithography structures onto various substrates simultaneously. This ensures faster and more precise production processing. The |EVG 40 mask aligner is also engineered to observe and monitor every step of the production process. It is fitted with an internally mounted CCD camera and an automatic gain detection system that records and processes real-time imaging, thereby drastically increasing process accuracy. The |EV GROUP 40 mask aligner is an efficient microlithography tool for the precise mask alignment and exposure of patterns onto substrates. Its advanced stage design ensures extreme accuracy and repeatability, while its efficient features make it suitable for a wide range of lithographic applications. Its built-in monitoring systems further ensure process monitoring and increase production performance.