Used EVG / EV GROUP 420 #9292586 for sale

EVG / EV GROUP 420 Mask Aligner is a highly technologically advanced equipment designed for photolithography applications. Utilizing next-gen optics, the system is able to accurately align photomasks for nanoscale applications. This unit is capable of printing features as small as 35nm or higher, making it an ideal choice for the most cutting-edge technologies. In addition to its impressive printing accuracy, EVG 420 also offers a wide range of features that make it an attractive option for high-precision manufacturing. EV GROUP 420 Mask Aligner consists of a 10.4 megapixel camera sensor, adjustable imaging lens, high-precision motorized stages, integrated vacuum wafer chuck, and a high-end PC for controlling the entire machine. The tool also offers a wide selection of software options, allowing users to have complete control over all parameters of the Photolithography process. The asset offers high-precision alignment accuracy up to 15nm, and is capable of accurate pattern printing of 35nm or higher features. Its focus and position feedback model ensures consistent print results, while the high mover velocity and repeatable positioning gives greater throughput for high-volume production. Additionally, the equipment features alignment monitoring systems and autofocus capability. 420 Mask Aligner also offers a wide variety of important safety features, such as an integrated emergency stop button, manual operability override, and auto shutoff function. These safety features help to ensure a safe work environment for any manufacturing team. All in all, EVG / EV GROUP 420 Mask Aligner is a powerful, versatile, and extremely accurate system that is perfect for any complex photolithography operations. Its advanced technologies and variety of software options make it an ideal choice for any production facility looking to stay ahead of the curve and produce the highest-quality nanoscale products.