Used EVG / EV GROUP 620 #293592949 for sale

EVG / EV GROUP 620 is a fully automated mask aligner used for wafer-level photolithography processing. It offers a broad range of applications for research, development, and production purposes. EVG 620 utilizes a high-precision, two-dimensional galvo scanner, which is responsible for controlling the pattern to be created on the wafer. This mask aligner also offers superior accuracy, with a minimum spot size of 2.2 microns and a maximum positional accuracy of +/- 10 nanometers. It also provides a wide range of substrates that can be used, such as Si (silicon), Kapton, glass, and quartz. Using EV GROUP 620, the user is able to create patterns and perform photolithography processes on wafers up to 8-inch in diameter, including those embedded with small electronic components. Additionally, the mask aligner offers a wide working range of ±25mm in the XY axes, allowing for fast patterning on large wafers. The mask aligner also offers a high-level of automation, with user-friendly, touch-screen controls and an automated alignment system. It is also capable of generating various optical powers, including 5-20mW for standard non-porous substrates and 20-80mW for porous substrates, allowing for the generation of high-resolution patterns with excellent repeatability. 620 also utilizes state-of-the-art software, which enables users to perform wafer processing using a high degree of precision. The user-friendly interface allows users to quickly and easily design, align and etch features on the mask. Overall, EVG / EV GROUP 620 provides an effective, efficient, cost-effective solution for industries that require wafer-level photolithography processing. Its powerful, user-friendly software, combined with its excellent accuracy and automated controls, make it an ideal choice for research, development, and production purposes.