Used EVG / EV GROUP 620 #293732724 for sale

EVG / EV GROUP 620 mask aligner is a precision lithographic tool designed for the fabrication of microelectronic and optoelectronic devices. This tool enables users to precisely pattern fine-line and ultra-fine-line features into substrates using contact lithography. EVG 620 is capable of producing sub-micron features with high yield and accuracy. EV GROUP 620 has a variable illumination equipment which comprises mask and wafer stages, one or two movable mirrors, and independent focus, exposure, and alignment controls. This feature enables the system to expose substrates with optical wavelengths ranging from 350 nm to 560 nm. The unit can also be configured with software control to enable the use of various lithography processes. 620 is integrated with automated alignment functionality thanks to its built-in laser module. This feature greatly increases the accuracy of the mask alignment and overlay step which reduces process time and cost. The mask aligment machine uses two laser diode beams to ensure accurate alignment of the photomask and substrate within the lithographic tool. The alignment accuracy for a given geometry is better than 0.2 microns. In addition, EVG / EV GROUP 620 offers automated pattern generation capabilities. Utilizing sophisticated software, users can generate highly detailed optical scripts for each reticle in the manufacturing process. This software allows for the optimization of accurate exposures to minimize the occurrence of defects and minimize shot-to-shot variations. EVG 620 is well suited to a number of industrial applications including high resolution reticles, defect reduction in microelectronic devices, and thin film photovoltaic devices. Its combination of accuracy, performance, and production friendly features make it an excellent choice for manufacturers.