Used EVG / EV GROUP 620 #9144780 for sale

EVG / EV GROUP 620
Manufacturer
EVG / EV GROUP
Model
620
ID: 9144780
Wafer Size: 6"
Double-sided mask aligner, 6".
EVG / EV GROUP 620 is a high-end, photo-lithographic mask aligner designed for precise and accurate alignment of masks, wafers, and substrates. It is a Computer-to-Mask Aligner (CMA) that allows for alignment of exposure masks to substrates with maximum precision and accuracy. The system is capable of patterning stencils with a resolution of 1 μm for semiconductor and electronic components. EVG 620 has two stepper motor-driven XY motion platforms that offer precise alignment of the substrate. These platforms drive a motion platform which holds an exposure mask, allowing it to move in two axes in precise increments. This combined with the mask which holds a specific pattern or design, makes it possible to transfer a substrate or wafer without contact with low misalignments or displacement. In addition to providing precise alignment for photo-lithography processes, EV GROUP 620 also has autofocus capabilities. Autofocus ensures that the substrate is scanned precisely and accurately before the exposure process begins, making sure the whole process is performed in an optimal way. 620 comes with an intuitive and clear graphical user interface that allows for easy operation and setup. It allows for precise and rapid positioning, meaning the entire photo-lithography process can be completed quickly and seamlessly. In addition, EVG / EV GROUP 620 is designed to be modular and can be easily upgraded to meet the changing requirements of customers. This allows for flexibility for potential upgrades down the line. Finally, EVG 620 is highly configurable and can be customized to fit specific applications. Whether it is for high-precision alignment or delicate fine-line work, EV GROUP 620 can be set up according to different customer requirements. 620 is a high-end, photo-lithographic mask aligner that provides precise and accurate alignment of exposure masks and substrates, with an integrated autofocus system, and a clear graphical user interface. It is modular and customizable, and comes with the ability to be upgraded, allowing for seamless operation and maximum user satisfaction.
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