Used EVG / EV GROUP 620 #9149820 for sale

EVG/EV Group EVG / EV GROUP 620 is a next-generation mask aligner used in optical lithography. It offers higher levels of accuracy, uncompromised uniformity, and superior process consistency than other mask aligners in its class. The equipment features a fully-automated, high-speed alignment stage. It utilizes a micropositioning system with an unprecedented level of accuracy and repeatability. The optical probing camera helps to determine the exact position of the wafer sample. The optical alignment unit meets semiconductor standards for critical dimension uniformity across wafers, and the high-resolution alignment sensor provides precise positional accuracy. The mask stage consists of a fully automatic, high-speed pointing unit with a plane of field-of-view, which constantly adjusts based on the mask size and photoresist thickness. This ensures the accuracy of mask placement and reduces potential registration errors. Additionally, the machine has an integrated mechanical clamping tool that facilitates quick loading and unloading of the mask. The asset has several features that are designed to streamline user workflow and improve efficiency. The automated recipe model simplifies process setup and uniformity validation with only a single recipe. The intuitive user interface allows users to build and control process recipes quickly and allows for real-time adjustments. Additionally, the equipment supports up to five recipe runs concurrently for increased throughput. EVG 620 offers world-class optical lithography performance. Its high-precision alignment systems provide exceptional accuracy and repeatability. The fully-automated mask placement stage ensures precise mask positioning, and the intuitive user interface allows users to easily adjust recipes and process settings. The system also features integrated temperature control technology for repeatable and reliable process performance.