Used EVG / EV GROUP 620 #9160674 for sale

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Manufacturer
EVG / EV GROUP
Model
620
ID: 9160674
Wafer Size: 4"-6"
Vintage: 2005
Mask aligner, 4"-6" Chuck size: 2", 4" & 6" Mask holder: 3", 5" & 7" Printing mask holder / Chuck Alignment: Topside & Back side Cassette to cassette and manual mode TSA / BSA / NIL module GENMARK Robot 2005 vintage.
EVG (EV GROUP) EVG / EV GROUP 620 is an automated and all-in-one mask aligner that is extensively used within the field of photolithography for a variety of applications in the semiconductor industry. EVG 620 is a flexible, high-precision lithography tool that offers a wide range of aligning and imaging capabilities, enabling it to be used for the manufacture of complex integrated circuit (IC) chips and other microelectronic devices. EV GROUP 620 is equipped with highly accurate and repeatable positioning for critical lithography applications. It combines a 5-axis high-precision XY-theta global positioning equipment (GPS) stage with a multi-axis piezo-driven local alignment system (LAS), which results in an impressive accuracy and repeatability in the nanometer range. 620 also boasts of a state-of-the-art polarizing beam splitter (PBS) microscope, which enables high-magnification optical imaging to support alignment with sub-micron resolutions. Moreover, EVG / EV GROUP 620 also includes an integrated laser diode imaging unit that further enhances its imaging capability. EVG 620 is able to process a variety of substrates with a large range of resist thicknesses. Its high-precision stage allows it to align and accurately image ICs on substrates up to 300 millimeters (12 inches) in size. It is also capable of formation of dual damascene features, creation of trenches, vias, gates, or even complex 3D structures. EV GROUP 620 has an extensive array of configurations and options that allow it to be tailored to specific customer requirements. These configurations include an IC aligner, a mask aligner, a wafer scanner, a mask scanner, and a pulse laser direct imaging machine, among others. In addition, 620 has a user-friendly and intuitive Graphical User Interface (GUI) with touch screen technology, which makes it easy to use even by inexperienced users. This all-in-one mask aligner is designed for compatibility with practically every process control tool, allowing easy integration and operation within any existing in-house fabrication processes. Moreover, this machine is capable of operating in a cleanroom environment and is backed by exceptional service and support to ensure optimal operation at all times. Overall, EVG / EV GROUP 620 is an amazing mask aligner that offers state-of-the-art performance and the highest quality standards in the industry. Its advanced capabilities and reliability make it one of the best choices for photolithography applications.
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