Used EVG / EV GROUP 620 #9206564 for sale

EVG / EV GROUP 620 is a full-field, semi-automated photolithography mask aligner. It is capable of producing high-precision wafers used in the process of semiconductor device fabrication. The alignment accuracy is 0.8 μm, enabling precise patterning of features with high resolution. The machine consists of a main frame and a equipment controller. The main frame consists of an alignment stage, a viewer, and a vacuum system. The alignment stage is able to accurately position the object holder, the transfer chuck, and the frame holding the mask. It also houses a number of optical elements including an illuminator, a focusing lens, and an objective lens. These components are used to direct a focused light beam onto the surface of the alignment stage. The viewer is a digital unit consisting of a camera and a monitor. It is used to accurately align and monitor the position of each element on the stage. The vacuum machine is in charge of providing the necessary pressure for the alignment process. EVG 620 utilizes a combination of a aligner, overlay and wafer step metrology to achieve throughput times of <2 minutes per wafer. Its alignment accuracy is based on three-dimensional image-based alignment technology. This technology is based on the capture and analysis of images, taken with a high definition visible light microscope. The alignment algorithm is used to calculate the coordinates of the wafer and mask and provide precise guidance info to the X-Y-θ stage. The wafer step metrology also involves a microscope, but this time the focus is on measuring the step heights of the device on the wafer. It employs optical interferometry to generate a three-dimensional profile of the device and determine the exact step sizes. This technology enables measurement of even very fine step heights with a resolution of 0.1 μm. EV GROUP 620 is a reliable photolithography mask aligner that can be used for a variety of projects in the semiconductor device fabrication process. It combines state-of-the-art alignment and metrology technology to provide accurate results in a fraction of the time.