Used EVG / EV GROUP 620 #9207967 for sale

EVG / EV GROUP 620 is a high-precision alignment and multi-purpose mask aligner optimized for advanced alignment and patterning through fast, precise and versatile operation. It features a low thermal budget operation for breakthrough fabrication of nanoscale devices where thermal imprinting distortion is an issue. EVG 620 consists of a wafer and mask handling stage, beam project and shutter equipment, precision mask translation stage, controller, and motorized illumination and projection lens system. Wafer and mask stability is ensured by a proprietary EVG/EV GROPU P6000 substrate and pattern carrier port technology. This technology allows for effortless loading, total automation, and easy positioning of up to 5″ wafers and 10″ x 10″ pattern carriers. EV GROUP 620's precision alignment optics unit consists of a Zemax-based optical machine featuring a computerized Fresnel lens for improved field of view and reduced aberrations. It is further equipped with a dual-illumination-and-projection tool and an intra-field distortion correction option. Wafer alignment is done using the machine's array of advanced alignment sensors and auto aligning software. It is also equipped with advanced alignment modes to support different alignment and patterning needs. Working with accurate overlay values, 620 precisely overlaps patterns on wafers to create complex structures. Other noteworthy features of EVG / EV GROUP 620 include its laser interferometer-based overlay and patterning accuracy, and a hydraulically driven shutter for precise exposure control. The asset is also suited to work with an array of materials, from traditional photomasks to advanced device materials such as SiGe or GaN. Overall, EVG 620 is a powerful and versatile mask aligner and a trusted choice for applications that require the utmost accuracy and precision. It is the perfect tool for creating nanoscale devices and has become indispensable in fabrication labs around the world.