Used EVG / EV GROUP 620 #9216173 for sale

EVG / EV GROUP 620 is a mask aligner, which is used in the semiconductor industry to produce integrated circuits (ICs). It is a laser micro-patterning tool that utilizes a high-resolution camera to direct a laser beam onto a mask of a specific geometry. The 420 mm² X-Y stages are able to accurately position the mask during patterning, achieving a minimum alignment accuracy of ±0.3 µm. The equipment has a rotation angle of ±7°, allowing for maximum processing flexibility. EVG 620 features a VIRTUAL STAGE™ Control software, which provides a quick, user-friendly workplace and easy-to-use interface. It enables users to program the laser with the required parameters and efficiently control production processes. The software also provides a comprehensive report detailing the programmed parameters and system information, which helps monitor the accuracy and repeatability of the unit. EV GROUP 620 operates using an advanced, air-cooled laser with a wavelength of 355 nm. The laser light is reflected at the mask and then directed to the substrate, where the developed pattern is defined. This process is completed within two to three minutes, depending on the type and complexity of the pattern. 620 has an integrated synchronousXY-scanning machine, and provides a high-precision trajectory for the laser beam and the mask, ensuring precise patterning. The unit features an interesting dynamic focus compensation technology, which ensures optimum focus in all directions. It also features a unique pump and filter on the substrate. EVG / EV GROUP 620 also offers users a smart configuration tool that helps in the production of large-scale ICs. It is equipped with an on-axis wafer chuck, which uniformly aligns the wafer. Additionally, the integrated prism-based refocusing asset minimizes the need for global refocusing operations and increases productivity. EVG 620 also features a laser autofocus model that quickly adjusts the laser focus during scanning and improves pattern yield. Furthermore, this unit is capable of handling a range of different substrates and is optimized to work with all types of resist materials. Overall, EV GROUP 620 is a highly efficient and precise mask aligner, allowing users to produce complex and intricate patterns with a minimum of fuss. It is an ideal choice for users looking to produce detailed semiconductor chips and integrated circuits in an efficient and reliable manner.