Used EVG / EV GROUP 620 #9223622 for sale

EVG / EV GROUP 620 is an advanced mask aligner that allows for precise optical lithography with a large area of uniform patterning. It is capable of processing substrates up to a size of 500 mm x 500 mm and is designed to meet the demands of next generation photomask markets. The equipment is based on a work cell concept which makes it highly versatile and reliable. It is equipped with 5 exposure modes, including 4-field, semi-field, auto pilot and full field scanning, and a dedicated leveler and rotation system for accurate alignment. The platform is equipped with a high-resolution video camera, allowing for precise video imaging of the wafer and observation of process results. EVG 620 adopts an advanced optical unit to ensure high precision lithography, using state-of-the-art optics including an automatic aspheric scanning lens and a fluoride objective lens. The machine is further equipped with a dedicated alignment tool, allowing for a high degree of automation and repeatability. EV GROUP 620 is designed to simplify integration processes for mask production, leveraging a number of features such as automated surface cleaning, advanced wafer and mask recognition routines and multiple process control functions. It also allows for a variety of mask sizes and substrate materials to be used. The asset is also equipped with an integrated wafer handler, allowing for the automated interchange of wafers, making it ideal for high-throughput production. Additionally, the software can also be tailored to meet the customer's specific requirements. Ultimately, 620 mask aligner offers a unique combination of performance, flexibility and precision. It is a powerful tool for the production of complex photomasks, and ideal for optical lithography applications in microelectronics, semiconductor and nanotechnology research.