Used EVG / EV GROUP 620 #9224786 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 9224786
Vintage: 2006
Mask aligner
Chuck, 4" (Soft & hard & vac contact)
Chuck, 6" (Edge handling, proximity)
Exposure light, Ø 6"
Mask holder, 5"-7"
Backside alignment
Operating system: Windows XP
2006 vintage.
EVG / EV GROUP 620 series of mask aligners are advanced photolithography systems designed for high precision photomask alignment and lithographic fabrication. This equipment is capable of producing extremely precise images on a wafer level with minimal temperature variation. EVG 620 is suitable for a range of applications including process control and metrology. It uses the integral LensScan 3D+ vision system to capture images and perform advanced imaging functions with its digital camera. This imaging technology is highly precise and provides up to 3.5-micron resolution. The aligner has a high-precision stage driven by a servomotor, and the stage covers travel range of 53mm by 53 mm and can move to between 25 and 4,000 mm/s with 0.02 mm resolution. The auto-aligning properties of EV GROUP 620 are both reliable and powerful. It has a high-resolution alignment accuracy of 0.7 μm and can execute ultrafast 9µs pattern alignment. The auto-alignment feature also includes advanced overlay and process control software. The unit also includes a proprietary and ultra-accurate optical distortion correction module which runs in real time. The module is compatible with resist processes where beam control is critical for resolving the highest level of structures. 620 is compliant with DRIE and ICP etching, as well as chemical processes such as Cleans, Oxides, CMP and Dopants. It is capable of single-wafer micromask alignment and process control, as well as multi-mask stack alignment. The hardware of EVG / EV GROUP 620 enables fully automated operation with low operating cost and fast delivery time. The machine includes a robust graphite platform and a 5-inch process chamber for "all-in-one" capabilities. It is also equipped with a rapid recipes conversion and flexible cluster capability as well as an optional CD/CNS tool for multi-user operation. In conclusion, EVG 620 is a highly advanced mask aligner that meets all of the standards for precise photolithography and process control. With its advanced imaging functions, reliable auto-aligning properties, robust hardware and flexible operation, it is an ideal choice for a variety of fabrication and metrology needs.
There are no reviews yet