Used EVG / EV GROUP 620 #9244743 for sale

EVG / EV GROUP 620 is a mask aligner that is designed for high precision and high throughput photolithography applications in the semiconductor industry. It is a reliable, high-performance mask aligner with an integrated, automated mask centering equipment. The system features superior alignment accuracy and repeatability, as well as fine control of exposure parameters such as focus, pressure and gap. EVG 620 is equipped with a 5-axis XYZ stage motion unit and a 6-axis microscope stage for optimal alignment flexibility. The two-stage vacuum chuck also ensures stability of substrates during high-resolution processing. The stepper can accommodate wafer sizes of up to 200mm and is ideal for controlling different types of resists, including coater-receptor combinations. It offers excellent exposure uniformity, repeatability and light throughput with its high-power UV illuminator. Its built-in exposure controller allows absolute dose control from 25mJ/cm2 to 500mJ/cm2 with exposure accuracy of 0.02mL. What's more, the machine is built on a sturdy cast aluminum structure, ensuring long term stability and precision. The tool has a user-friendly graphical interface with an intuitive menu and control asset, making it simple and easy to use. It also features advanced automation capabilities such as auto-wafer focus with centering functions, automatic reticle alignment, automatic process correction, and the ability to perform non-stop, multi-product processing. Lastly, EV GROUP 620 is equipped with a wide range of customizable features such as a 3D mapping model, multi-mask alignment, multi-chamber capability, and edge to edge performance. The equipment is a valuable tool that can meet the diverse needs of the photolithography industry.