Used EVG / EV GROUP 620 #9261506 for sale

EVG / EV GROUP 620 is a mask aligner that is used for nanolithography, specifically photolithography. It is a semiconductor patterning instrument that is capable of accurately transferring and aligning patterns, such as lines and vias, onto a substrate. The main components of EVG 620 are the optical column, laser control systems, and the wafer stages. The optical column of the Aligner EV GROUP 620 is capable of projecting light through a variety of masks and reticles, which are used to transfer a pattern onto a substrate. The column also houses light delivery and relay optics, such as the galvo mirrors, which move the pattern of light over the substrate. Additionally, it contains precision stages that direct the laser beam in order to accurately align patterns. The laser control systems of the Aligner 620 are used to adjust the power, wavelength, and exposure time of the laser to match the desired pattern. The system also contains optics, such as a multalingual viewport, so that users can ensure accuracy when aligning patterns. Finally, the wafer stages of the Aligner EVG / EV GROUP 620 are responsible for the movement of the substrate. The stages are capable of rapidly locating and positioning substrates with high accuracy so that patterns can be aligned correctly and precisely. EVG 620 has an extended travel range and a repeatability of 1 µm, allowing for excellent positioning accuracy. Overall, EV GROUP 620 Mask Aligner is a reliable and precise patterning instrument for lithography. With its laser control systems, optical column, and wafer stages, it is capable of accurately transferring and aligning patterns onto substrates quickly and effectively.