Used EVG / EV GROUP 620 #9266635 for sale

EVG / EV GROUP 620 mask aligner is a dedicated precision tool used for fabricating patterns into a variety of substrates. It is ideal for batch fabrication of integrated circuits, MEMS and microsystems, thin film heads, flexible electronics, and a wide range of other applications. EVG 620 is a fully automated equipment which offers superior accuracy and throughput rates. Its alignment power is based on an advanced image processing technique, coupled with a high-resolution linear measurement sensor, to ensure that each element is placed precisely in its desired location. This system has a user-friendly touch-screen interface, allowing ease of setup, operation and maintenance. The core of this unit is an advanced alignment architecture with automatic lens optimization, full 4-quadrant sensing, and programmable overscan pattern for fast and accurate results. It also features an integrated machine controller with onboard diagnostics to check for errors. EV GROUP 620 tool is equipped with a unique substrate chuck asset, which can hold substrates up to 8" in diameter. It can handle both circular and rectangular wafers, and can even process several dies of varying geometry on the same wafer. Its alignment accuracy is ±2μm, and its mask overscan accuracy is within ±1μm. Furthermore, 620 mask aligner features several technologies which help ensure uniformity and uniform deposition, such as a 'tilt and rotation' feature, MEMS chuck tilt compensation, and cathode gas control. Its standard features also include an atmospheric pressure chamber and a repeatable software process. It also has a high-accuracy camera model with CCD resolution. In addition, EVG / EV GROUP 620 mask aligner is designed to provide a fast and reliable lithography equipment. Its capabilities allow manufacturing of complex products with superior results. The system has low capital and operating costs, making it ideal for cost-effective production. This unit is ideal for those requiring high volumes of complex parts, as well as for smaller scale prototyping operations.