Used EVG / EV GROUP 620 #9276197 for sale
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ID: 9276197
Wafer Size: 6"
Vintage: 2004
Mask aligner, 6"
Top side and bottom optic module
Manual spindle alignment stage
Hg UV Lamp: 1000 W
2004 vintage.
EVG / EV GROUP 620 Mask Aligner is a fully automated, stand-alone mask aligner for the production of high resolution photomask lithography applications. It is designed with ease of use and efficient operation in mind, allowing users to create high quality photomasks with the minimum of effort. The aligner utilises the latest in optical surface imaging, optical distortion correction and laser stabilised prober technology to create extremely accurate photosensitive printing plates with high aspect ratios and minimal alignment errors. This allows for crystalline-level features with alignment precision down to 0.1µm. In addition, EVG 620 Mask Aligner offers advanced process control capabilities, from pre- alignment to post- measurement and verification. A scanning electron microscope is included for error correction, and a variety of inspection tools are available to evaluate the mask surface. The system can automatically adjust the parameters of the process to ensure the best possible performance of the process. Additionally, EV GROUP 620 Mask Aligner is designed to be significantly faster than other mask aligners available on the market, with an alignment speed of one minute per alignment. The system can also be connected to a PC, allowing for remote access to the software and control of the system. 620 Mask Aligner has the ability to generate extremely precise wafer substrates with clear geometric shapes. In addition to this, it also has high resolution and low dispersion imaging capabilities, making it an ideal choice for high-end photomask sculpting applications. EVG / EV GROUP 620 Mask Aligner is the ideal choice for users looking for an efficient and accurate mask aligner, offering users high precision correction, advanced process control capabilities, and fast alignment speeds.
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