Used EVG / EV GROUP 620 #9283060 for sale

EVG / EV GROUP 620 is a mask aligner, designed to produce structures of nanometer levels of precision. It is a versatile tool, designed to produce heterogeneous, single layer or multi-layer material structures and patterns. The machine uses lithography technology, as well as new advances in the alignment and measurement of wafer microstructures with nanometer precision. EVG 620 is extremely accurate with features designed to ensure consistently high performance welding, patterning and etching. The device includes high-resolution alignment and nanometer-level accuracy in the placement of structures and patterns. The stepper includes a CCD camera, which is used for measuring alignment, z-position and structure location. This enables precise and reliable alignment of the necessary patterns that are produced in the final product. EV GROUP 620 is ideal for creating extremely high resolution images of nanometer scale structures through evaporation evaporation. The device utilizes it's evaporation technology to accurately vaporizes the molecular-level material required for the nanometer and sub-micron feature sizes. The stepper also uses a specialized, closed loop Auto Align technology. This means that the stepper is constantly making corrections to ensure alignment between the mask and substrate wafers. This allows for improved accuracy in the final product. In addition, 620 includes a pre-align and post-align feature that make sure that the alignment between the mask and the wafer is undisturbed during the process. The pre-align stage aligns the mask before the exposure and the post-align assists in improving the alignment with the wafer. EVG / EV GROUP 620 is equipped with an advanced frontal and edge exposers to ensure that the patterns are correctly exposed. The stepper also includes feature such as Auto Focus and Polarization that help to improve the accuracy of the patterns. EVG 620 offers a wide range of plasma etch options that can help to produce nanometer patterns with high accuracy. It has options such as helium plasma process, argon plasma process, and oxygen ozone plasma process. The plasma etched patterns are highly reliable and can be used to create complex material microstructures. The device is user-friendly and comes with user-friendly ATC software for controlling the device. This software allows easy control, monitoring and operation of the device. It also includes tools such as automatic parameter adjustment, curve-fitting, statistical analysis and a built-in database. EV GROUP 620 also has the ability to produce patterns with extremely high aspect ratios. It is also designed to be used with all types of archival materials including metal, glass, polymer resin and ceramic layers. 620 is an indispensable tool for creating precise and reliable nanometer-level structures and patterns. It is a versatile device which ensures that the final products are of the highest standard.