Used EVG / EV GROUP 620 #9352151 for sale

EVG / EV GROUP 620 is a high-precision mask aligner used to align and transfer a pattern, such as a photomask, with extreme accuracy onto the substrate. This aligner uses a six-axis robotic arm to provide unparalleled 4-micron, sub-nanometer repeatability. It has the capability to transfer and align features as small as 0.5 micron with a 5-sigma accuracy of 1 micron across a 6-inch wafer size. EVG 620 uses patented beam exposure technology, which is capable of producing a homogeneous beam spot pattern with excellent form accuracy. Its high-resolution spatial light modulator array makes it ideal for liquid crystal display and semiconductor mask alignment applications. The equipment's eight dedicated actuated stages enable high throughput with fast alignment speed, and its photonic logical controls offer immediate feedback for longer production runs. An intuitive user interface ensures precise setup, and a built-in library enables access to frequently used parameter sets for further convenience. EV GROUP 620 utilizes a state-of-the-art optical alignment station that allows for 100 percent field-of-view coverage and can be configured for up to five channels. This aligner has an advanced beam augmentation system that combines a set of five centroid-focus lenses with unique beam control features for greater productivity. Its integrated software utilizes an intelligent pattern matching algorithm and advanced macro techniques to improve alignment accuracy. Additionally, 620 offers different alignment modes to accommodate different application demands, and the metrology unit provides feedback for continuous process optimization. The aligner's unique autofocus machine delivers the optimum acceptance criteria for extremely accurate alignment for all wafer sizes, with no manual intervention. Furthermore, this tool also features advanced global alignment options, such as XY or XYT functions, to ensure more efficient wafer-level alignment.