Used EVG / EV GROUP 6200 #9168654 for sale

EVG / EV GROUP 6200 Mask Aligner is a powerful automated equipment designed for lithography and inspection applications in the semiconductor fabrication, microelectronics, and photonics industries. This precision-engineered equipment is capable of generating uniform, high-resolution images on substrates ranging from wafers to semiconductor chips and flat-panel displays. EVG 6200 Mask Aligner features an XY resolution of 5 um (0.2 mils) with high overlay accuracy and excellent position repeatability. This capacity allows for the fabrication of highly complex circuits and integrated circuits. Equipped with an efficient, low drift operability, EV GROUP 6200 can process substrates with a maximum size of 200mm x 200mm (8" x 8"). In addition to its reliable performance, 6200 Mask Aligner also offers users a complete range of features. A built-in wafer handling system allows for fully-automated wafer loading, unloading, and alignment. The unit also includes an LED-based camera machine, allowing for clear and accurate mask micrographs. Data for each mask aligner can be stored and transferred using a high-speed network connection, increasing production efficiency. EVG / EV GROUP 6200 Mask Aligner can be equipped with a variety of additional applications and accessories, including process monitoring systems and laser exposure control. Used together, these systems allow for the precise control of process parameters in advanced processes such as resolution enhancement techniques, double-sided lithography, and advanced packaging. Constructioned with advanced and reliable technologies, EVG 6200 Mask Aligner is an ideal solution for high-performance and high-throughput lithography and inspection applications. Suitable for use in a wide range of environments, EV GROUP 6200 is an effective way to increase production efficiency and yield while minimizing costs. With a low-drift operation and excellent overlay accuracy, 6200 Mask Aligner is the perfect tool for a wide range of precise and complex applications.