Used EVG / EV GROUP 6200 #9296383 for sale

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Manufacturer
EVG / EV GROUP
Model
6200
ID: 9296383
Wafer Size: 8"
Vintage: 2006
Automated mask aligner, 8" Mask holder square, 9" Wafer chuck, 8" Double-sided / Backside alignment capability Manual load Motorized illuminator: 1000 W lamp (joystick) Manual XYZ stage (coarse and fine adjustments) PC Lamp Mirror 2006 vintage.
EVG / EV GROUP 6200 is a mask aligner that is designed to facilitate wafer-level lithography. This precision tool is used in the semiconductor industry for photomask fabrication and other related processes. Using a state-of-the-art optical imaging equipment with a high resolution, and novel alignment algorithms, EVG 6200 is capable of producing high-precision patterns on wafers. The device is equipped with a 6-inch (152.4 mm) station, which supports a range of sizes up to 12-inch (304.8 mm) wafers. It features a unique optical design, with a nominal resolution of 0.6 micron, allowing for superior alignment accuracy. Depending on the mode used, the alignment accuracy of the tool can reach a tolerance of ±0.01 microns. The maximum auto-alignment speed of EV GROUP 6200 reaches up to 3200 microns/s2, providing reliable, quick alignment processes. This accelerates productivity, while still achieving desired results. 6200 is designed with highly modularized platforms, which allows for an open architecture environment. This enables users to customize the system with their own rotational, indexing and wafer-handling components. This customization further enhances the unit's ability to perform well in specialized tasks. In terms of operation, the machine is outfitted with an intuitive graphical user interface (GUI) which allows users to quickly complete processes ranging from wafer placement to alignment and post-alignment actions. The GUI displays a comprehensive process flowchart which allows users to easily monitor the process. The tool offers various supports, including film frame support, wafer-frame support and metal-frame support. The metal frame support is designed to prevent slippage during loading and unloading of substrates, providing a stable and secure environment for the mask aligner. Overall, EVG / EV GROUP 6200 is a sophisticated mask aligner, capable of providing superior accuracy and precise results. Its cutting-edge technologies, modular platform and user-friendly interface ensures that users are able to quickly and effectively complete high-precision processes in a secure and reliable manner.
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