Used EVG / EV GROUP 6200TBR #9028178 for sale

EVG / EV GROUP 6200TBR is a mask aligner equipment designed to align substrates and masks accurately in preparation for subsequent lithography processes. It facilitates overlay alignment accuracy as well as step-and-repeat stepper alignment, making it the perfect choice for both wafer-level and panel-level imaging. EVG 6200TBR offers advanced lithography capabilities and is ideal for the fabrication of standards-compliant optical devices. The system supports optical resists with 5x, 10x, and 20x, magnifications. It also includes a built-in low-temperature stage and a resolution of 4μm for aligning features at the wafer level. EV GROUP 6200TBR features a high-precision, motorized stage for optimum accuracy in wafer-level alignment tasks. The unit's user-friendly design makes it easy to use, while its self-checking machine ensures reliable performance. It is equipped with a 6.5" LCD monitor and intelligent, automated features for easy image inspection. Additionally, 6200TBR offers integrated beam alignment, wafer loading, auto- focusing, and exposure control capabilities combined with advanced scanning techniques to ensure reliable imaging. EVG / EV GROUP 6200TBR is designed with safety in mind, featuring an onboard safety tool that prevents over-exposure of the substrate to radiation. This asset also ensures that radiation is kept at a safe level throughout a given photolithography operation. Additionally, EVG 6200TBR has an optional integrated platform that allows users to ensure contamination prevention and environmental control. EV GROUP 6200TBR is a flexible and reliable choice for mask alignment. It offers advanced functionality, accuracy, safety, and ease of use. By utilizing advanced imaging technologies, 6200TBR ensures that all processing steps are correctly aligned to produce optimal photoliyhography results.