Used EVG / EV GROUP 620TBR #9207968 for sale

Manufacturer
EVG / EV GROUP
Model
620TBR
ID: 9207968
Wafer Size: 6"
Vintage: 2002
Automated mask aligner, 6" Topside alignment (TSA) Bottom side alignment (BSA) Automatic alignment (3) Cassette station ergo load cassette station Cassette to cassette handling (can also be operated in manual mode) Up to 6" wafer capable Can be operated in proximity, soft contact, hard contact / Vacuum contact exposure modes Exposure optics: Type C, 350 nm - 450 nm, broadband Lamphouse: 500 W Motorized alignment stage (x, y, theta directions) to the 3-Axis joystick Microsoft windows based user interface System PC, keyboard, cables Operations manual for EVG 620 2002 vintage.
EVG / EV GROUP 620TBR Mask Aligner is an advanced device designed for high-resolution mask aligning and patterning. It is a fully automated wafer-based equipment that offers precision and accuracy while simplifying the process of generating complex patterns. EVG 620TBR provides very high alignment accuracy over the full wafer area, with cycle times ranging from seconds to minutes. This machine is also capable of producing high-yield results with high resolution patterning. EV GROUP 620TBR is equipped with advanced technology that enables the user to accurately position and exposure different patterns onto a single wafer. It features a high resolution optical alignment system and an evaporative exposure unit, which use scan lenses to adjust the size and shape of a pattern as it is projected onto the wafer. 620TBR is designed to handle a variety of substrate types, including industrial films, polarizer elements, x-ray-mask elements, and other thin-film materials. The machine is also capable of automatically aligning multiple substrates to each other with a high degree of precision. EVG / EV GROUP 620TBR utilizes an advanced control machine that provides user-defined alignment parameters and provides feedback on the alignment results. Each wafer can be individually monitored using the tool's software-based data storage asset. The machine also allows users to set up batch processing, which enables the patterning of multiple wafers with consistent results and reduced time demands. EVG 620TBR features a number of safety features, such as the ability to lock the wafer clamp and an emergency stop button, which allows users to quickly halt any operations in the case of an emergency. Additionally, the device is equipped with a range of safety sensors that actively monitor the environment, ensuring that any hazardous conditions are avoided. EV GROUP 620TBR Mask Aligner is an ideal tool for a variety of applications, ranging from nanolithography to microelectronics. In addition to its precision and speed, its user-friendly interface and safety features make this machine an efficient and reliable choice for commercial, industrial, and academic research.
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