Used EVG / EV GROUP 640 #293639247 for sale

EVG / EV GROUP 640 is an automated mask aligner designed for the efficient patterning, alignment and exposure of photomasks used in semiconductor fabrication. EVG 640 is capable of working with both quartz and chrome-on-quartz photomasks, providing the flexibility to pattern masks of any size or shape in a wide variety of processes. EV GROUP 640 utilizes a two-gantry robotic system with a micron-level accuracy, enabling the alignment of photomasks accurately to wafer substrates. The device is capable of adjusting individual masks for angle and position within a single exposure, providing more flexibility and robust positioning performance. Its linear motor driven positioners, in combination with its full-coverage high-resolution encoders, provide a high level of accuracy and stability for the photomask alignment. 640 incorporates a user-friendly interface with a variety of easily accessible features, ensuring efficient work processes and minimizing user error. It features a intuitive controller, with layer definition functionality, differential mask placement accuracy and process recovery capabilities. It also includes programmable, multi-level beam profiles that can be seamlessly adjusted to keep the maximum dose at the critical dimension level. EVG / EV GROUP 640 is outfitted with advanced software that provides a multitude of functions, such as defect inspection, process control, data collection and analysis. The software determines the optimal exposure parameters, such as exposure range, exposure time, illumination angle and pattern magnification, for each mask. It also enables the easy execution of different types of operations, such as substrate compensation, dose latency and multiple gate capability. Overall, EVG 640 is a powerful, advanced mask aligner that has been designed for high-precision alignment and exposure of photomasks in a range of substrates and processes. Its sophisticated software and intuitive user interface provide the performance and ease-of-use needed for productive, efficient mask alignment and exposure processes.